Polishing Pad (PAD) for Surface Finishing
It is possible to achieve a reduction in the number of defects on the substrate! A reduction in the "number of surface defects" can be reliably achieved.
This product is a polishing pad for final polishing manufactured by FILWEL Co., Ltd. (formerly Kanebo). By combining fine cerium oxide abrasives and colloidal silica, it achieves a high-quality surface with fewer defects. Currently, there are a total of four varieties in the series, with "Asker-C hardness" reaching level "53." This product reliably reduces the "surface defect count," which is considered unacceptable in the masking world. 【Lineup】 ■N7512 ■N0012 ■N0092 ■N0192 *For more details, please feel free to contact us.
- Company：八千代マイクロサイエンス
- Price：Other
